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Vacuum chemical vapor deposition furnace

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Vacuum chemical vapor deposition furnace GCVD-0510

 

Brief:

Vacuum chemical vapor deposition furnace consisting of deposition chamber, gas supply system and exhaust system, is utilized for composite materials densifying by resistance heating or induction heating on condition that depositional gas flooding into the furnace under vacuum environment is high temperature pyrolyzed and deposited onto the materials.    

 
 

Application:CFC products, pyrolytic graphite, resistance material coating, powder synthesis 

 

Features:Easy operation, convenient maintenance, adequate for variety of coating or composite material  production, uniform dense products with high purity and fine grain size.      

 

 

Parameters:

 
 
 
Furnace types are able to be tailor-made in accordance with processes and production requirements of customers.

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